Student seminars

#StudentSeminar: Mist-CVD Growth of Gallium and Indium Sesquioxides Thin-Films

by Carolina Fernández Saiz

Europe/Madrid
1001-Primera-1-1-1 - Paterna. Seminario (Universe)

1001-Primera-1-1-1 - Paterna. Seminario

Universe

60
Description

The development of functional thin films is crucial for enhancing electronic device performance, but conventional vacuum-based fabrication methods are costly and energy-intensive. In this context, Mist Chemical Vapor Deposition (Mist-CVD) has been developed, allowing for the growth of metal oxides in a simple and cost-effective manner.

In this seminar, we present the fundamental principles of the Mist-CVD system installed in our laboratory for obtaining gallium and indium sesquioxides, as well as their alloys. Additionally, we propose a systematic parametric study aimed at optimizing the growth conditions and providing a detailed morphological and structural characterization of the obtained materials.

Organized by

Benedito Donizeti Botan Neto
José Luis Rodrigo Ramón

Your browser is out of date!

Update your browser to view this website correctly. Update my browser now

×